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Thursday, 18 April 2013 08:55

Porous Alumina

 Porous Alumina template with 70nm diameter pores

Thursday, 18 April 2013 08:41

Z-Range Imaging of Razor Blade

Large Z-Range AFM Imaging

A) 55x55 µm AFM image of razor blade with 57.2 µm Z range

B) 25x25 µm zoom-in AFM image around the razor blade apex

C) 3D presentation shows the sharp apex with height of 50.68 µm

  • Nanonics 3D Flatscan™ stage allows for a large Z- range of up to 100 µm and for up to 200 µm in the tip and sample scanning combined stages. 
  • The 3D Flatscan™ structure allows for flexible mounting and scanning of samples with complicated geometries including hanging samples.
  • Combined with Nanonics' Deep Trench Glass probes, Nanonics' MultiViewTM systems allow for side-wall scans.
  • Large Z-range imaging is fully correlated with an optical microscope and confocal Raman microscopes through a free optical axis from top and bottom. Comprehensive structural and chemical analysis is readily provided with theMultiViewTM SPM series systems.

Ideal systems for large Z scans:

Thursday, 18 April 2013 08:29

Topographic Imaging of Silver

   

A) AFM Topographic image of Silver Nanoparticles

B) Zoom-in AFM image of the blue square marked in A

 

  • Silver nanoparticles formed by annealing deposited on transparent conductance oxide ITO substrate. 


  • High accuracy of zoom-in imaging within a previous scan are obtained with all Nanonics MultiViewSPM series. %
Thursday, 18 April 2013 08:24

Textile AFM Imaging

AFM scan (53.2x53.2 µm) of textile fibers with tens of microns of Z range (29.19 µm)

2D (Left) and 3D (Right) AFM topographic images are presented above.

Nano-textile technology deals with nanometric domains (e.g. nano particle coatings) laying on micrometric fibers. Topographic imaging of such nanometric domains is challenging within the large Z topographies of the textile fibers.

The MultiViewTM SPM series efficiently addresses this challenge with its dynamic Z range. The Nanonics 3D FlatScanTM attains a Z range of 100 µm, and can achieve even up to 200 µm in tip/sample-scanning combined modes.

 

Zooming AFM images (3D presentation) for locating nanometric features on micrometric textile fiber.

Wednesday, 17 April 2013 10:18

SEM and AFM Integration Imaging

Integrated SEM and AFM Imaging

SEM images of a Nanonics AFM Non-obscuring Probe

 


 

Probe in contact with a sample inside the vacuum chamber of the SEM. 
Magnification: 120X (top) and 1000X (bottom). 
The sample is a patterned GaN sample with a line spacing of 10microns.

 

 

The Scanning Electron Microscope (SEM) has difficulty obtaining information on a variety of samples. One such situation is the case of a trench in a semiconductor wafer in which a SEM cannot view the bottom or the sidewall of the trench structure.

Using the unique AFM capabilities of the MultiView 400™  The operator of a SEM or FIB machine can ask, on line, questions about high aspect ratio structures (eg. side wall angles and the surface structure of these sidewall in a variety of important devices with vias and other structures.

 
 
A Nanonics MultiView 4000™head inside the chamber of a SEM chamber

Imaging a deep trench such as the one opposite is impossible with standard silicon AFM tips. The Nanonics deep trench probes together with the large scan range of the 3D FlatScan™ makes these images possible for the first time.
 
 

10 x 10 micron AFM image of a 10 micron deep/2 micron wide trench (Z-range 10 micron)

     
The bottom of a deep trench    


Nanonics deep trench probes make it possible to form images from the bottom of a deep trench of up to 1.5mm.
 
 
 

1 x 1 micron AFM image of the bottom of the deep trench (Z-range 100 nm)

     
Side wall image    


Only the Nanonics 3D FlatScan is able to scan in the X-Z plane to image features on the side of a deep trench
 
 
 

5 x 5 micron X-Z scan of the sidewall of the deep trench (Y-range 150 nm)

Wednesday, 17 April 2013 10:11

Quantum Dots Images

 

AFM topographic image of nanometric CdSe quantum dots  dispersed on  H2 treated gold substrate 

  •  Quantum dots with dimensions of few nanometers are easily imaged with 

    Nanonics SPM MultiView series due to the sub-Angstrom accuracy of the XYZ 3D 

    FlatScanTM sample stage.

  •    The ultra-sensitive phase feedback of the Nanonics Integra Controller  with its 

    large dynamic range and its low Z noise provide a clear image of nanometric 

    features inspite
     of a relatively large topographic background.   

 

Ideal systems for this application:

Wednesday, 17 April 2013 09:56

Nanonics Microscopes Can Use Any Probe

 

Near-field optics can employ many different probes. One such probe is a silicon cantilever with an aperture and this probe which can be used with Nanonics Systems can be purchased from Nascatec [http://www.nascatec.com/]. 


Although all Nanonics platforms allow for the use of such a probe, these probes do not exhibit the exposed probe tip geometry of glass probes and do not emulate the guiding of light that is inherent in an optical fiber. 


A prerequisite for producing light at the tip of such silicon based NSOM apertures is the ability to bring a lens in close proximity to the back side of the probe and this is of course possible with Nanonics platforms. However, large fluences of light from the lens of the microscope are needed to illuminate the aperture. This results in a large amount of scattering and a reduction in the signal to noise. Because there is no exposed probe geometry in these probes an on-line separate illumination or collection channel with the lens of the optical microscope is not possible, since the microscope lens is dedicated to illuminate the aperture. As a result reflection imaging becomes difficult, and the lack of light guiding abilities does not permit scanning the probe such as in collection mode imaging. 

 

   
Wednesday, 17 April 2013 09:12

FIsher's sample Topographic Imaging

Topographic Image

4 x 4 microns

Topographic Image

1.2 x 1.2 microns

 

3D Representation of the Topographic Images

 

Wednesday, 17 April 2013 09:00

FIB Etched Trench Imaging

  

 

 

Figure 1:
A)
 CCD picture of FIB Etched Trenches.
B) CCD picture shows Nanonics’ AFM glass probe during AFM scan of deep trench structure shown in (A).

 

 

 

Figure 2:
A) 
AFM 3D (60x60 microns) presentation of the FIB etched feature shows a deep trench imaged with AFM Nanonics’ glass probe.
B) 2D AFM image show a line crossing the trench for line profiling.
C) Topography line profile (presented in B) showing large Z height of ~30 microns.

  • The above AFM image was obtained with the MultiView 1000TM SPM head.
  • Nanonics' 3D Flat ScanTM stage allows for unprecedented large Z scans of up to 100 microns.
  • Nanonics' unique glass probes with high aspect ratios and normal force sensing allows for scanning such complicated topographies.

WSxM software has been used for image processing of the pictures above: I. Horcas et al. Rev. Sci. Instrum. 78, 013705 (2007)

Wednesday, 17 April 2013 08:50

Deep Trench Imaging

A Nanonics MultiView SPM system was used to obtain images of a 
silicon wafer sample (below) with deep trenches (prepared by the Bosch process). Deeply etched structures like these are essential for many applications; as such there is an ever increasing demand for improvements in etching technology. This will prove vital for the manufacture of electronic devices, particularly in the development of sensors with greater sensitivity and accuracy.

 

 

 

   

 

A CCD Image of the holes

  2D AFM topographic Image of holes


Above we can see examples of sidewall imaging in trenches with depths of greater than 22 microns. This is only made possible by virtue of Nanonics’ MultiView systems with their 3D Flat Scanner with its large (200 microns) Z range and its combination with our special patented, deep-trench glass cantilevered probes. Such probes, with their extended tip length and high aspect ratios enable the investigation of deep crevices and trenches. 

The image on the upper left shows the AFM image of a Si wafer and its holes /trenches. The probe was then used to image the sidewalls of one of these holes and this is shown in the upper right-hand image. Nanonics probes are able to reach into sidewalls due to their exposed tips and thus scan in X-Z, something impossible to achieve with regular silicon AFM probes. Nanonics cantilevered probes make such fine sidewall imaging a reality! 

 

At the bottom is shown a scanning electron microscope (SEM) image of the same sidewall. Nanonics’ systems are also transparently-integrated with SEM and FIB.

 

SEM image of Trench

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