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Figure 1: NanoIndentation obtained on SiO2 thin layer in Si obtained with 50nm Berkovich Diamond tip.
A) AFM topographic image of a nanoindentation obtained with a load of100µN.
B) Line profile crossing the nanoindentation areas shows a depth of 36.5nm.
C) AFM topographic image of a nanoindentation obtained with a load of50µN.
D) Line profile crossing the nanoindentation areas shows a depth of 15.08nm.
WSxM software has been used for image processing of the pictures above: I. Horcas et al. Rev. Sci. Instrum. 78, 013705 (2007)
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