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Free Space Interconnect Light Wave Measurement
Lens fiber Characterization
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Topography and Simultaneous Near-Field/Far-Field Light Distribution of a Micro Lensed Fiber (609kB)
 
Nano3D Beam Profiler
Nano3D Beam Profiler
Now is the time to leave the world of deconvoluted beam profiling with slit scanners and goniometers behind.

Enter the new world of true Nanometric Beam Profiling with simultaneous topographical positioning.


  • True Nanometric Profiling of Beams on the Micron Scale
  • Lensless Distortion Free Methodology 
  • No Deconvolution Necessary
  • Multiple Beam Nanopositioning and Nanoprofiling
  • Ultra-high 50nm Optical Resolution
  • Large Wavelength Range: 400-2000nm


Collage of 3D topographic profile of an ultrasmall diameter fiber lens with super -imposed color map of optical distribution
 Conventional disply 3D optical profile

A Breakthrough in Profiling Technology

The Nanonics 3D Near-field beam profiler brings to the market, for the first time, a profiler able to produce actual, high precision, 50 nm optical resolution, without deconvolution. Today, 3D profiles of even the most complex of beam structures can be generated for optimal alignment. Such resolutions can be obtained from the near-field to the far-field with overlapping fields of view.
The Nano3D beam profiler is based upon our patented cantilevered optical fibers with no inteference from out-of-focus light. In combination with our unique 3D FlatScan scanner allows three dimensional profiling of both passive (eg. AWGs—arrayed wave guides) and active light sources (eg. VCSELs, LEDs). Such divergent sources can be profiled with unprecedented error free resolution without distortions in the near and far-field. 

Unprecidented Ultra Resolution


Ultra resolution beam size can now be correlated with accurate topographic positioning for beams under 100microns. The Nano3D Beam profiler produces simultaneous nanometric resolution topography overlaid with optical distribution.
With a lensless archetecture of there can be no non-uniformities or astigmatisms in profiling. The Nano3D makes direct measurements in the near-field so no deconvolution is necessary, there are no errors due to complex beam structures, detector saturation or beam attenuation.

Analyze complex beam profiles with topography from active sources such as DFB Lasers at a variety of injection currents. 

System Specifications


Parameter Specification
Nano Positioning ±0.001 µm
Positioning with Profile ±0.05 µm
Sampling Resolution <0.001 µm
Width variation over 25 samples ±0.05 µm
Dynamic Range 106
Mode Field Diameters Single Mode Fibers; Specialty fibers etc.
Multiple Beam Options Number Dependent on the nature of sources
Signal digitization 16 bit
Scan Speed Software controllable
Software Compatability Windows XP; LabVIEW Environment
Accuracy
Beam Waist <1% even for sources with >20 degreedivergence;< FONT>
Beam Position & Size 100 nm accuracy< FONT>
3D Beam Size & Beam Pointing <100 nm


Phone: +972-2-6789573 Fax: +972-2-6480827 USA Toll Free (direct to sales): 1-800-289-7162
Patch Clamping | Photonic Band Gap | atomic force microscopy | scanning probe microscope | near field optics | NanoLithography
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