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Super User

 2010-10-05

FEI Company, a leading instrumentation company providing electron microscope systems for applications across many industries, has announced that it has entered into an agreement to collaborate with Nanonics Imaging Ltd. to explore the feasibility of adding an atomic force microscope (AFM) to an FEI DualBeam™ focused ion beam (FIB)/scanning electron microscope (SEM) system.
 
Nanonics' AFM is used for imaging, measuring and manipulating matter at the nanoscale. It uses a mechanical probe to measure the surface topography of a sample. The DualBeam is a FIB/SEM system that provides three dimensional (3D) imaging and analysis down to the nanoscale. The DualBeam uses an SEM to image FIB-milled cross sections, which reveal subsurface features.

 

FEI DualBeam

About FEI 
FEI (Nasdaq: FEIC) is a leading diversified scientific instruments company. It is a premier provider of electron- and ion-beam microscopes and tools for nanoscale applications across many industries: industrial and academic materials research, life sciences, semiconductors, data storage, natural resources and more. With more than 60 years of technological innovation and leadership, FEI has set the performance standard in transmission electron microscopes (TEM), scanning electron microscopes (SEM) and DualBeams™, which combine a SEM with a focused ion beam (FIB). FEI's imaging systems provide 3D characterization, analysis and modification/prototyping with resolutions down to the sub-Ångström (one-tenth of a nanometer) level. FEI's NanoPorts in North America, Europe and Asia provide centers of technical excellence where its world-class community of customers and specialists collaborate. FEI has approximately 1800 employees and sales and service operations in more than 50 countries around the world. More information can be found at: www.fei.com.

 

Nanonics' MultiView 4000

About Nanonics 
Nanonics Imaging Ltd. is the market leader of combined near-field optical microscopes (commonly referred to as either NSOM or SNOM systems) and atomic force microscopes (AFM). Incorporated in 1997, Nanonics is the longest established and most experienced supplier of such systems in the market, whose products have won several awards. These awards have recognized innovations and pioneering developments in multiprobe atomic force microscopy and transparently integrated AFM Raman microspectroscopy. Nanonics platforms with their associated probe technologies have circumvented barriers that have prevented AFM from effective integration into electron optical and similar upright microscope geometries. More information can be found at: www.nanonics.co.il 

 

 

2012-10-24

Dr. Fu uses Nanonics Imaging Multiview 2000 system which is utilized for its exceptional qualities optimized for plasmonic research. NSOM probing is a fundamental SPM measurement in the field of plasmonic lenses and one of the unique capabilities of the MV 2000 system.

The author carried out intensive work in plasmonics using Nanonics Imaging instruments. Below we can see an image of his research, an elliptical nanopinholes-based plasmonic lens with images of NSOM probing. In addition he has published several papers including:  

Study of the Plasmon Talbot Effect of Metallic Nanolenses Induced by Linearly Polarized Illumination. L. Li, Y. Zhang, Y. Fu, T. Wang, Z. Lu, Q. Sun, and W. Yu, Plasmonics 7, 641 (2012).

Experimental Study of Metallic Elliptical Nano-Pinhole Structure-Based Plasmonic Lenses. Y. Zhang, Y. Fu, Y. Liu, and X. Zhou, Plasmonics 6, 219 (2011).

Polarization and Filter Properties Investigation of Metal Gratings and Rings. R. He, Y.-K. Wu, and X. Zhou, Plasmonics 7, 389 (2011).

The following link includes a chapter from the book which describes an interesting application for plasmonic lenses.

http://www.intechopen.com/books/plasmonics-principles-and-applications

(a) SEM micrograph of the elliptical nanopinholes-based plasmonic lens.

(b) 2D image of NSOM probing along propagation distance at z=20nm in free space.

(c) 3D image of NSOM probing.

 

 

2012-05-02

Nanonics Imaging is pleased to invite its current and future customers to an upcoming User Workshop on Tuesday, May 8th from 6:00 – 8:00 pm at the F1 Conference Room in the San Jose Convention Center. The Workshop, to be held during the CLEO 2012 Conference & Exhibition, will feature prominent scientists presenting new developments and research highlights related to their work using Nanonics systems.

The featured speakers are as follows:

Prof. Uriel Levy, Head of the NanoOpto Group, Department of Applied Physics, 
the Hebrew University of Jerusalem, will present on 
New Applications in Nanophotonics, Plasmonics and Optofluidics.

Prof. Nancy Haegel,  Distinguished Professor of Physics, the Naval Postgraduate School (NPS) in Monterey, CA, will present on: “Imaging Transport Using Integrated NSOM/AFM in a Scanning Electron Microscope.”

Nir Shitrit, PhD Candidate with Prof. Erez Hasman, Micro and Nanooptics Laboratory, Faculty of Mechanical Engineering, the Technion - Israel Institute of Technology, will present on:"Spin-Dependent Plasmonics Based on Interfering Topological Defects."

The workshop is free of charge and open to the public. Light refreshments will be served.

Nanonics will be participating in the CLEO Exhibition at Booth #1227, where they will demonstrate their newest SPM systems including multi-probe AFM & NSOM systems. 

About Nanonics Imaging:

Nanonics Imaging is a leading global provider of innovative AFM and NSOM systems in the SPM market. Since its inception in 1997, Nanonics has introduced new concepts in system functionality, including our revolutionary approach to NSOM imaging with cantilevered NSOM probes, dual tip/sample scanning AFM systems, Raman/AFM, Multi-probe AFM, and SEM/AFM systems. Nanonics systems are distributed worldwide and are the leading instruments in near-field characterization in plasmonics and photonics. For more information, please visit our website at: www.nanonics.co.il.

Nanonics Imaging, Ltd.
Jerusalem ISRAEL

Phone: +972-2-678-9573
Fax: +972-2-648-0827
USA Toll Free (direct to Sales): 1-866-220-6828

or 1-800-289-7162

Email: info@nanonics.co.il  

 

2012-06-05

Haegel heading to the Hebrew University in Jerusalem to work with Professor Aaron Lewis

 

Nanonics warmly congratulates Distinguished Professor Dr. Nancy Haegel of the Physics Department at the Naval Postgraduate School (NPS) in Monterey, CA for winning a 2012 Fulbright scholar award for her research and lecturing in near-field scanning optical microscopy.  Haegel’s work will take her to Hebrew University in Israel, where she will have the opportunity to work with and learn from Professor Aaron Lewis of the Department of Applied Physics, a world-renowned expert and pioneer in near-field imaging techniques. 

Professor Haegel developed a novel system for imaging carrier transport within semiconductor nanostructures using the Nanonics MultiView 2000 AFM inside a scanning electron microscope (SEM).

 

It is a great honor to be selected by the Foreign Scholarship Board for a Fulbright award to Israel,” said Haegel. “I am very excited about the opportunity to participate in cutting-edge research at Hebrew University and also to help build the international relationships and collaborations that are central to the Fulbright Program. To do the best job in teaching and research, we always need to be learning new things and seeing the world from different perspectives. This is a great opportunity to do exactly that.”

 

Among Haegel’s many previous honors are a David and Lucile Packard Fellowship in Science and Engineering (1988), a Humboldt Fellowship at the Max Planck Institute for Extraterrestrial Physics (2000), the American Physical Society Prize for Research at an Undergraduate Institution (2004), the Schieffelin and Griffin Awards for Teaching Excellence at NPS (2008, 2010). Professor Haegel is a member of the Board of Trustees of the University of Notre Dame and recently completed a three-year term on the American Physical Society Committee on the Status of Women in Physics.

 

The Fulbright Scholar Program is administered by the Council for International Exchange of Scholars, and sponsored by the United States Department of State, Bureau of Educational and Cultural Affairs. The program sends 800 U.S. faculty and professionals abroad each year.

 

About Nanonics Imaging:

Nanonics Imaging is a leading global provider of innovative AFM and NSOM systems in the SPM market. Since its inception in 1997, Nanonics has introduced new concepts in system functionality, including our revolutionary approach to NSOM imaging with cantilevered NSOM probes, dual tip/sample scanning AFM systems, Raman/AFM, Multi-probe AFM, and SEM/AFM systems. Nanonics systems are distributed worldwide and are the leading instruments in near-field characterization in plasmonics and photonics. For more information, please visit: www.nanonics.co.il.

 

2012-07-04

AFM courses offered online for the first time by Purdue University professors this fall will cover static and dynamic methods and provide instruction on a widely used AFM simulation tool, VEDA. Like the massive open online classes that have been making headlines, the new AF courses will be delivered to broad audiences, but nanoHUB-U\'s initiative is unique -- providing instruction and cloud services for performing computationally intensive simulation from a Web browser

https://www.youtube.com/watch?feature=player_embedded&v=rsN_gLuf1tI

Thursday, 21 February 2013 11:36

Surface Plasmons Imaging

Plasmons of Gold Features on Silicon Nitride Sample

 

   
   

 

AFM/NSOM Imaging of Surface Plasmons on Gold Features of Silicon Nitride Substrate

A: Top view optical image of gold/silicon-nitride sample with free laser beam illumination from bottom. AFM/NSOM with transparent optical axis is shown at top left.

B: NSOM image obtained in collection mode shows surface plasmons distribution at gold area edge.

C: AFM/NSOM collage image shows optical and topographical overlapped data of section shown on B.

D: Plasmon distribution of two slits located on above sample.

Because of their free optical axis from above and below, as well as their tip-scanning capabilities, MultiView heads MV2000, MV4000 and CV2000 are the optimal systems for this application.  

Thursday, 21 February 2013 11:29

Resonant Waveguide

Waveguide-Mode ON and OFF Resonance

 

       

 

Linear Resonant Waveguide Slot Array AFM/NSOM ON and OFF Resonance Characterization. The Optometronic 4000TM system has been used to couple the light in and out of the waveguide using fiber nanoaligers.

A: 8x8 µm AFM image obtained by AFM/NSOM probe presents two sections of waveguide.

B: Online NSOM image performed in Collection mode OFF resonance. No energy transfer is seen.

C: Online NSOM image performed in Collection Mode ON resonance. High efficiency of energy transfer is seen.

D: Transmission efficiency at waveguide selected area, collected at output of waveguide during scan ON Resonance.  

Thursday, 21 February 2013 09:26

Transistor NSOM Imaging

Reflection Mode NSOM

 
 
 
 

AFM topographic image of semiconductor transistor  

NSOM Reflection mode imaging of transistor at left  
 
 
 
 

  3D  Height Presentation  

 3D NSOM Presentation

 

• All MultiView systems allow for online AFM/NSOM imaging of opaque samples in Reflection mode

• Transparent fiber probe allows for free optical axis from top for Reflection mode imaging with true confocal optical microscope

 
Thursday, 21 February 2013 09:23

Surface Plasmon Vortices

 
 
 
MultiView 4000TM has been used to demonstrate the generation of surface plasmon vortices with arbitrary higher order vortex topological charges with novel plasmonic vortex lens (shown at the scheme below).

(a)-(d) and (e)-(h) are experimental NSOM images and simulations of the near-field distribution above the Plasmonic Vortex Lens at right-handed and left-handed circular polarization (respectively).

(c) Ez distribution of the near-field calculated by the RCWA. The number of node lines is five, which indicates that the topological charge of the SP vortex is l ) 5. The white arrows in (a)-(c) denote the directions of the rotation of the polarization. (d) Comparison of the intensity profiles. The red dashed line corresponds to the result of the theoretical model, i.e., the square of the absolute value of the fifth order Bessel function of the first kind. The blue solid line depicts the field intensity along the dashed line in the NSOM image. The black dotted line shows the field intensity along the dotted line in the RCWA image (Figure 3b). (e), (f), (g), and (h) correspond to (a), (b), (c), and (d), respectively, but from the left-handed circularpolarization beam.

Byoungho Lee et al Nano Lett. 2010, 10, 529-536  

   

Experimental setup for NSOM imaging of light distribution above Plasmonic Votrex Lens using Nanonics MultiView 4000TM system which has a free optical axis from top and bottom for bottom illumination of the sample and upright view (up to 100x) for tip-sample accurate positioning.

Byoungho Lee et al Nano Lett. 2010, 10, 529-536

 
Thursday, 21 February 2013 09:19

Cathode luminescence

Near Field Cathode Luminescence

Transparent AFM integration inside SEM and FIB chamber allows for unique protocols in NSOM cathode luminescence GaN nano wires

 

     
 

Near-field cathode luminescence from a GaN nanowire under ion beam excitation obtained with MultiView 2000TM in SEM chamber. On-line AFM (upper left) and NSOM (upper right) images obtained in collection mode. AFM/NSOM collage image is presented at bottom.
Baird et at, Physica B: Condensed Matter Volume 404, Issues 23-24, (2009)

 

 
     

 

 

 

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